MOTIV™ Inline Buffer Formulation
Meet the technology that is truly built for you and is designed to move you beyond your downstream processing bottlenecks.
MOTIV™ 5
For your complex buffer makeup needs, our 5-pump IBF systems offer maximum flexibility for multi-component buffers. Systems are available in flow rates of up to 200 L/h, 1,200 L/h or 2,000 L/h for process development to production scale.
200 L/h
Process Development
1,200 L/h
Clinical Small Scale Manufacturing
2,000 L/h
Large Scale Manufacturing
Built For You
Driven by our patented Pro-Yield™ inline recirculation blender technology 5-Pump and custom inline buffer formulation systems can meet almost any space, cost or performance need.
Patented Pro-Yield™ Recirculation Blender Technology
All MOTIV systems include our patented, Pro-Yield recirculation blending technology to shorten the buffer adjustment response rate. The dynamic, single-pass mixer efficiently blends your liquid streams inline – regardless of flow rate or viscosity – to allow for a faster setpoint target and faster washout volumes.
MOTIV™ 5 as a “Buffer Factory”
Leverage MOTIV 5 within an existing facility as a “buffer factory” to feed your existing bags or tanks.
THOUSANDS
Sq ft of GMP floor space saved
1000+ HRS
Saved in buffer prep
MILLIONS
Liters of buffers produced
Product Options
MOTIV 52 | MOTIV 512 | MOTIV 520 |
20 — 200 L/h | 120 — 1200 L/h | 200 – 2000 L/h |
Mobile console format | Space-saving skid format | |
Up to 20x dilution | Up to 20x dilution | |
770 mm W x 1360 mm D x 1600 mm H | 1530 mm W x 1070 mm D x 1830 mm H |
Note: Dimensions are approximate. Customized systems for unique applications are also available.
OCELOT™ System Control
Each MOTIV™ is outfitted with the latest in automation capabilities – OCELOT™ – bringing intuitive configuration in a universally compatible format. OCELOT can integrate and/or interface with your plant-wide control system – allowing for far-reaching data collection and analysis.
- Designed to be simple and straightforward
- OPC-ready architecture, with remote method configuration and batch review
- Point-of-use scale up/scale down